T. Kamino et al., IN-SITU HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDY ON A SURFACE RECONSTRUCTION OF AU-DEPOSITED SI AT VERY HIGH-TEMPERATURES, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 75(1), 1997, pp. 105-114
In-situ high-temperature high-resolution electron microscopy was appli
ed to st study of the surface modification of Au-deposited Si. The exp
eriment was carried out above the melting points of small particles of
Au (approximately several nanometres in diameter) in a 300 kV high-re
solution analytical transmission electron microscope equipped with a d
irect-heating-type specimen-heating holder in a vacuum of 4-6 x 10(-6)
Pa. Facet-unfacet transformation and reconstruction of the Si{111}, {
001}, {211} and {311} surfaces induced by wetting of molten Au atoms h
ave been observed at near-atomic resolution. It is concluded that molt
en Au atoms remove a surface amorphous layer on the Si surface, making
the surface clean even in a non ultra-high vacuum.