IN-SITU HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDY ON A SURFACE RECONSTRUCTION OF AU-DEPOSITED SI AT VERY HIGH-TEMPERATURES

Citation
T. Kamino et al., IN-SITU HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDY ON A SURFACE RECONSTRUCTION OF AU-DEPOSITED SI AT VERY HIGH-TEMPERATURES, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 75(1), 1997, pp. 105-114
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter","Metallurgy & Metallurigical Engineering
ISSN journal
13642804
Volume
75
Issue
1
Year of publication
1997
Pages
105 - 114
Database
ISI
SICI code
1364-2804(1997)75:1<105:IHESOA>2.0.ZU;2-6
Abstract
In-situ high-temperature high-resolution electron microscopy was appli ed to st study of the surface modification of Au-deposited Si. The exp eriment was carried out above the melting points of small particles of Au (approximately several nanometres in diameter) in a 300 kV high-re solution analytical transmission electron microscope equipped with a d irect-heating-type specimen-heating holder in a vacuum of 4-6 x 10(-6) Pa. Facet-unfacet transformation and reconstruction of the Si{111}, { 001}, {211} and {311} surfaces induced by wetting of molten Au atoms h ave been observed at near-atomic resolution. It is concluded that molt en Au atoms remove a surface amorphous layer on the Si surface, making the surface clean even in a non ultra-high vacuum.