COMPARISON OF SURFACE-ROUGHNESS OF POLISHED SILICON-WAFERS MEASURED BY LIGHT-SCATTERING TOPOGRAPHY, SOFT-X-RAY SCATTERING, AND ATOMIC-FORCEMICROSCOPY

Authors
TEICHERT C MACKAY JF SAVAGE DE LAGALLY MG BROHL M WAGNER P
Citation
C. Teichert et al., COMPARISON OF SURFACE-ROUGHNESS OF POLISHED SILICON-WAFERS MEASURED BY LIGHT-SCATTERING TOPOGRAPHY, SOFT-X-RAY SCATTERING, AND ATOMIC-FORCEMICROSCOPY, Applied physics letters, 66(18), 1995, pp. 2346-2348
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
18
Year of publication
1995
Pages
2346 - 2348
Database
ISI
SICI code
0003-6951(1995)66:18<2346:COSOPS>2.0.ZU;2-Y