H. Junge et E. Popowski, N-SILYLATION AND SI-O BOND SPLITTING AT T HE REACTION OF LITHIATED SILOXY-SILYLAMINO-SILANES WITH CHLORO TRIMETHYLSILANE, Zeitschrift fur anorganische und allgemeine Chemie, 622(12), 1996, pp. 2065-2073
Citations number
24
Categorie Soggetti
Chemistry Inorganic & Nuclear
Journal title
Zeitschrift fur anorganische und allgemeine Chemie
Lithiated Siloxy-silylamino-silanes were allowed to react in tetrahydr
ofurane (THF) and in n-octane (favoured) and n-hexane, resp., with chl
orotrimethylsilane. The monoamide (Me(3)SiO)Me(2)Si(NLiSiMe(3)) gives
in THF and in n-octane the N-substitution product (Me(3)SiO)Me(2)Si .[
N(SiMe(3))(2)] 1, the diamide (Me(3)SiO)MeSi(NLiSiMe(3))(2) only in TH
F the N-substitution products (Me(3)SiO)MeSi[N(SiMe(3))(2)](2) 2 (main
product) and (Me(3)SiO)MeSi[N(SiMe(3))(2)] (NHSiMe(3)) 3. In n-octane
the diamide reacts mainly under Si-O bond splitting. The cyclodisilaz
ane [(Me(3)SiNH)MeSi-NSiMe(3)](2) 6 is obtained as the main product. B
yproducts are 2, 3 and the tris(trimethylsilylamino) substituted disil
azane (Me(3)SiO)(Me(3)SiNH)MeSi-N .(SiMe(3))-SiMe(NHSiMe(3))(2) 7. The
triamide (Me(3)SiO)Si .(NLiSiMe(3))(3) reacts under Si-O and Si-N bon
d splitting in n-octane as well as in THF. The cyclodisilazanes [(Me(3
)SiNH)(2) . Si-NSiMe(3)](2) 10 and )RSi-N(SiMe(3))-Si(OSiMe(3))(NHSiMe
(3))-N(SiMe(3)) (11: R = Me(3)SiNH, 12: R = (Me(3)Si)(2)N) are formed,
in THF furthermore the N-substitution products (Me(3)SiO)Si[N(SiMe(3)
)(2)]. (NHSiMe(3))(2) 4 and (Me(3)SiO)Si[N(SiMe(3))(2)](2)(NHSiMe(3))
5. The Si-O bond splitting occurs in boiling n-octane also in absence
of the chlorotrimethylsilane. An amide solution of (Me(3)SiO)MeSi(NHSi
Me(3))(2) with n-butyllithium in the molar ratio 1:1 leads in n-octane
and n-hexane to 6 and 7, in THF to 3. The amide solutions of (Me(3)Si
O)Si .(NHSiMe(3))(3) with n-butyllithium the molar ratio 1:1 and 1:2 g
ive in THF 4 and 5, respectively.