NANOSECOND TIME-RESOLVED EMISSION-SPECTROSCOPY FROM SILICON IMPLANTEDAND ANNEALED SIO2 LAYERS

Citation
A. Pifferi et al., NANOSECOND TIME-RESOLVED EMISSION-SPECTROSCOPY FROM SILICON IMPLANTEDAND ANNEALED SIO2 LAYERS, Applied physics letters, 70(3), 1997, pp. 348-350
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
3
Year of publication
1997
Pages
348 - 350
Database
ISI
SICI code
0003-6951(1997)70:3<348:NTEFSI>2.0.ZU;2-R
Abstract
Photoluminescence decay curves and nanosecond time-gated spectra were measured from silicon implanted SiO2 layers after thermal annealing. D ifferent ion fluences and annealing times were tested. Three component s emitting blue-green light with lifetimes of about 0.4, 2, and 10 ns were detected. The peak position of all components moves to longer wav elengths upon increasing the ion fluence. This short-wavelength emissi on seems to be related to the presence of extended defects acting as p recursors of nanocrystals. A slower (microsecond) component, centered in the near infrared and attributed to nanocrystals, was also identifi ed in the highest fluence implant considered (3 x 10(17) cm(-2)). (C) 1997 American Institute of Physics.