DIFFUSION OF COPPER IN POROUS SILICON

Authors
ANDSAGER D HETRICK JM HILLIARD J NAYFEH MH
Citation
D. Andsager et al., DIFFUSION OF COPPER IN POROUS SILICON, Journal of applied physics, 77(9), 1995, pp. 4399-4402
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
9
Year of publication
1995
Pages
4399 - 4402
Database
ISI
SICI code
0021-8979(1995)77:9<4399:DOCIPS>2.0.ZU;2-L