KINETIC SMOOTHENING - GROWTH THICKNESS DEPENDENCE OF THE INTERFACE WIDTH OF THE SI(001) SIO2 INTERFACE/

Authors
DAWSON JL KRISCH K EVANSLUTTERODT KW TANG MT MANCHANDA L GREEN ML BRASEN D HIGASHI GS BOONE T
Citation
Jl. Dawson et al., KINETIC SMOOTHENING - GROWTH THICKNESS DEPENDENCE OF THE INTERFACE WIDTH OF THE SI(001) SIO2 INTERFACE/, Journal of applied physics, 77(9), 1995, pp. 4746-4749
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
77
Issue
9
Year of publication
1995
Pages
4746 - 4749
Database
ISI
SICI code
0021-8979(1995)77:9<4746:KS-GTD>2.0.ZU;2-2