A. Sleiman et al., MONTE-CARLO STUDY OF DIFFUSION PHENOMENA IN III-V MODULATION-DOPED HETEROSTRUCTURES, Semiconductor science and technology, 12(1), 1997, pp. 69-76
This paper presents a Monte Carlo study of diffusion coefficients in t
wo-dimensional electron gas (TDEG) in III-V heterostructures. The mode
l accounts for the quantization of all valleys and for non-parabolicit
y. The diffusion coefficients are determined by the spreading of a nar
row pulse of carriers drifting along the interface. Two kinds of heter
ostructures have been considered: AlGaAs/lnGaAs/AlGaAs and the AllnAs/
lnGaAs/AllnAs lattice matched on InP. The diffusion coefficient-field
characteristics at 77 K temperature have been extensively studied. Lar
ge deviations from the Einstein relation have been observed, even at l
ow-fields. The longitudinal diffusion coefficient is shown to be stron
gly field dependent and may reach high values for fields around 1 kV c
m(-1). Its evolution is explained by the behaviour of scattering rates
, especially for impurity and phonon scattering.