Thin films of baron nitride were prepared by three deposition methods:
r.f. plasma deposition, pulsed laser deposition and r.f. magnetron sp
uttering. The films were characterized by Fourier transform IR spectro
scopy, Raman spectroscopy, X-ray photoelectron spectroscopy, optical t
ransmittance spectrophotometry and spectroscopic ellipsometry in the v
isible-near-UV range. The films are highly transparent with atomic B:N
ratios from 2.5 to 1.1, and refractive index values between 1.6 and 1
.9 depending on deposition conditions. IR and Raman spectra revealed a
short-range atomic order with hexagonal BN bonds, which is more marke
d in r.f. plasma-deposited films. From the spectroscopic ellipsometric
measurements, the optical response of the films was analysed using a
two-layer model and applying the Bruggeman effective medium approximat
ion far each layer.