FABRICATION AND CHARACTERIZATION OF MODIFIED LAYER IN ION-IMPLANTED ORGANIC FILMS

Optical and electrical changes in several kinds of organic films after ion implantation were investigated. Vacuum evaporated organic films w ere irradiated by 30-100 keV N+ ion beam. The ion dose was varied from 10(14) to 10(16) ions/cm(2). The surface resistivity varies 9 orders of magnitude from the order of 10(17) ohm/(square) to 10(8) ohm/(squar e). Furthermore, the film color changes to dark brown with increasing dose, and main optical absorption peaks of the organic molecule itself decreased. The electrical and optical changes by ion implantation see m to reflect chemical elements and physical properties of these films originated from the molecular structure. Furthermore, the large increa se in conductivity by ion beam irradiation is due to the formation of carbon clusters in the organic films. These experimental results sugge st that the modification of optoelectric properties and three dimensio nal wiring in organic films by ion implantation are promising techniqu es for molecular electronic devices.