MONOLAYER FILMS OF DIBLOCK COPOLYMER MICRODOMAINS FOR NANOLITHOGRAPHIC APPLICATIONS

Citation
P. Mansky et al., MONOLAYER FILMS OF DIBLOCK COPOLYMER MICRODOMAINS FOR NANOLITHOGRAPHIC APPLICATIONS, Journal of Materials Science, 30(8), 1995, pp. 1987-1992
Citations number
17
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
30
Issue
8
Year of publication
1995
Pages
1987 - 1992
Database
ISI
SICI code
0022-2461(1995)30:8<1987:MFODCM>2.0.ZU;2-6
Abstract
Several techniques have been investigated for creating large-area thin films of diblock copolymers, with well-ordered two-dimensional period ic microstructure on the scale of a few tens of nanometres. Such struc tures might potentially be used as templates for lithography, at a len gth scale not easily accessed by electron-beam methods. Using a copoly mer with a spherical microdomain structure, we find that it is quite e asy to obtain large-area films consisting of a monolayer of spherical domains, arranged on a hexagonal lattice with a lattice constant of 33 nm. Copolymers with cylindrical microstructure typically orient paral lel to the substrate and free surface, it has been found that the perp endicular orientation is metastable: if a well- or poorly-ordered film is initially prepared with the cylinders perpendicular to the surface , annealing results in a well-ordered film with the same orientation, with a lattice constant of 27 nm for the polymer used in this study. F or both cylinders and spheres, grains measuring typically 30 x 30 latt ice constants are readily obtained.