FABRICATION OF AU NANOPARTICLES BY RADIOFREQUENCY MAGNETRON SPUTTERING

We have investigated the evolution of the size and the morphology of A u nanoparticles fabricated by rf magnetron sputtering techniques at ro om temperature as a function of sputtering gas pressure, p; rf, input power, L; and sputtering rime, t. For 60 less than or equal to p less than or equal to 300 mTorr, Au nanoparticles were deposited. For 60 le ss than or equal to p less than or equal to 250 mTorr, the particle si ze increased with increasing Land extending t. On increasing L and t f urther, film formation occurred. When p = 300 mTorr, nanoparticles for med at L = 200 W.