A RIGOROUS ELECTRODYNAMIC MODEL FOR PERIODIC STRUCTURE FORMATION DURING UV LASER-INDUCED METAL ATOM DEPOSITION

Citation
Acr. Pipino et al., A RIGOROUS ELECTRODYNAMIC MODEL FOR PERIODIC STRUCTURE FORMATION DURING UV LASER-INDUCED METAL ATOM DEPOSITION, Chemical physics letters, 237(1-2), 1995, pp. 137-144
Citations number
25
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
237
Issue
1-2
Year of publication
1995
Pages
137 - 144
Database
ISI
SICI code
0009-2614(1995)237:1-2<137:AREMFP>2.0.ZU;2-I
Abstract
A model is presented which describes the time and spatial frequency ev olution of periodic structures formed during metal atom deposition ari sing from UV laser-induced photodissociation of organometallics. In ad dition to the occurrence of rapid growth of spatial frequencies which allow direct coupling of the incident radiation to the surface-plasmon polariton (SPP), a high-wavevector profile component, associated with the interference of counterpropagating SPP waves, also develops with extremely high gain but without feedback. Pump/probe diffraction metho ds for verifying the predictions and elucidating the surface modificat ion of photodissociation are briefly proposed. Deposition of aluminum by photolysis of (CH3)(3)A1 at 257 nm is chosen as the model system.