NEW METHOD OF ULTRA-THIN FILM CHARACTERIZATION APPLIED TO THE INVESTIGATION OF C NI/C STRUCTURES UNDER HEAT LOAD/

Authors
ZHELUDEVA SI KOVALCHUK MV NOVIKOVA NN SOSPHENOV AN MALYSHEVA NE SALASHENKO NN AKHSAKHALYAN AD PLATONOV YY CERNIK RI COLLINS SP
Citation
Si. Zheludeva et al., NEW METHOD OF ULTRA-THIN FILM CHARACTERIZATION APPLIED TO THE INVESTIGATION OF C NI/C STRUCTURES UNDER HEAT LOAD/, Thin solid films, 259(2), 1995, pp. 131-138
Citations number
27
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
259
Issue
2
Year of publication
1995
Pages
131 - 138
Database
ISI
SICI code
0040-6090(1995)259:2<131:NMOUFC>2.0.ZU;2-#
Abstract
A new technique for measuring the thickness and density of ultra-thin films has been developed. Films of the order of tens of angstroms have been studied by using a combination of X-ray standing waves generated in layered synthetic microstructures (LSM) and near-total external fl uorescence study. The technique has been used to study C/Ni/C trilayer s (deposited on Cr/C and W/C LSM) under heat load. It was found that v ariation on Ni and C layer parameters at elevated temperatures is affe cted primarily by the deposition conditions.