OBSERVATION OF CURRENT-DENSITY FILAMENTATION IN MULTILAYER STRUCTURESBY EBIC MEASUREMENTS

Citation
A. Wierschem et al., OBSERVATION OF CURRENT-DENSITY FILAMENTATION IN MULTILAYER STRUCTURESBY EBIC MEASUREMENTS, Scanning, 17(2), 1995, pp. 106-116
Citations number
6
Categorie Soggetti
Microscopy
Journal title
ISSN journal
01610457
Volume
17
Issue
2
Year of publication
1995
Pages
106 - 116
Database
ISI
SICI code
0161-0457(1995)17:2<106:OOCFIM>2.0.ZU;2-F
Abstract
The total current-voltage characteristics of the p(+)-n(+)-p-n(-) and n(+)-p-n-p(-) diodes under investigation show branches of negative dif ferential resistance. Accompanied by the appearance of negative differ ential resistance is a filamentation of current-density and electric-f ield distribution. Electron beam-induced current (EBIC) measurements w ere used to examine the properties of filamentation from the point of view of self-organized pattern formation. Besides the detection of the spatial distribution of the electric field, EBIC measurements give in formation on current-density filamentation. Furthermore, the perturbat ion by the electron beam gives information on the dynamic behavior of the filamentary structure.