The possibility of acceleration of B-10(+) ions up to the energy of 2.
7 MeV has been investigated with U-120 cyclotron. Ion implantation and
the preparation of semiconductor devices prototypes based on the sili
con - bor structures are performed. While the fluences of implanted io
ns are equal to 10(16) and 10(17) cm(-2), the bor concentration in the
surface layer of 1 mu m reaches 10(20) cm(-3).