GROWTH OF DIAMOND THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION

Deposition of diamond thin films on non-diamond substrates at low pres sures (< 760 torr) and low temperatures (< 2000 degrees C) by chemical vapour deposition (CVD) has been: the subject of intense research in the last few years. The structural and the electrical properties of CV D diamond films grown on p-type < 111 > and high-resistivity (> 100 k Ohm-cm) < 100 > oriented silicon substrates by hot filament chemical v apour deposition technique are described in this review paper.