K. Tsukui et al., CHANGES IN TRANSITION-TEMPERATURE OF THE SI(111)1X1-7X7 PHASE-TRANSITION OBSERVED UNDER VARIOUS OXYGEN ENVIRONMENTS, Surface science, 328(3), 1995, pp. 553-560
In order to investigate the role of oxygen atoms in the Si(111)1 X 1-7
X 7 phase transition, the transition was examined accurately under ex
tremely high vacuum conditions (<4 X 10(-10) Pa). Transition temperatu
re was measured for the modified-FZ crystal (resistivity; 4 x 10(4) Oh
m cm) in which the oxygen concentration was 7.0 X 10(15) atoms/cm(3),
and for a CZ crystal (resistivity: 5 Ohm cm) which contained 6.4 X 10(
17) oxygen/cm(3). The transition point was decided to be 1049 K for th
e modified-FZ crystal, and was lower than that for the CZ crystal by 4
0 K. By taking advantage of the modified-FZ in which the contribution
of outdiffusion to the surface equilibrium oxygen concentration is exp
ected to;be quite low, the oxygen concentration in the surface region
was controlled by quenching right after high temperature flashing and/
or oxygen exposure. The transition temperature was changed depending o
n the oxygen concentration. These experimental facts indicate that the
difference in the transition temperatures can be ascribed to the infl
uence of oxygen concentration on the stability of the 7 X 7 structure.