SOL-GEL PROCESSING OF ORIENTED SRTIO3 THIN-FILMS

Citation
U. Selvaraj et al., SOL-GEL PROCESSING OF ORIENTED SRTIO3 THIN-FILMS, Materials letters, 23(1-3), 1995, pp. 123-127
Citations number
23
Categorie Soggetti
Material Science","Physics, Applied
Journal title
ISSN journal
0167577X
Volume
23
Issue
1-3
Year of publication
1995
Pages
123 - 127
Database
ISI
SICI code
0167-577X(1995)23:1-3<123:SPOOST>2.0.ZU;2-H
Abstract
Sol-gel processing was employed to fabricate multilayered SrTiO3 thin films onto fused silica, Si (100) and SrTiO3 (110) substrates. A Sr-Ti alkoxide precursor solution, chemically modified with diisopropanolam ine, was hydrolyzed and spin-coated onto these substrates. These films were annealed at 300 degrees C and then heated to 650 degrees C for 1 h in air, which resulted in the formation of phase pure crystalline S rTiO3. X-ray diffraction analysis indicated that partially oriented fi lms were deposited onto fused silica and Si (100), while highly orient ed film was formed on SrTiO3 (110). A typical microstructure of the fi lm deposited on SrTiO3 (110) and heated at 650 degrees C for 1 h showe d the presence of submicrometer grains on the order of 0.05 to 0.1 mu m. The thickness of a single coating measured from the cross section o f the SEM micrograph was about 0.1 to 0.2 mu m.