THE PROPERTIES OF POLYETHYLENE AND POLYAMIDE IMPLANTED WITH B-DOSES( IONS TO HIGH)

The polyethylene and polyamide films implanted with 30 and 100 keV Bions to doses from 1.0 x 10(16) to 1.0 x 10(17) cm(-2) were studied us ing EPR and RBS methods. Two concurrent processes taking place in the implanted polymers were considered: (1) formation of two- or three-dim ensional carbon structures or polyene bonds, and (2) oxidation of spli tted carbon bonds with formation of carbonyl groups. The relative role of these processes depends on the implantation dose. The possibility of a magnetic ordering in the implanted polymer films and the formatio n of a conductive layer under the sample surface is also discussed.