AG-MU-M THICKNESS PREPARED BY ION-IMPLANTATION( SENSITIVE MEMBRANE OFSUB)

Authors
MOLLER D TAN PM HULLER J ALBRECHT J
Citation
D. Moller et al., AG-MU-M THICKNESS PREPARED BY ION-IMPLANTATION( SENSITIVE MEMBRANE OFSUB), Analytica chimica acta, 306(1), 1995, pp. 1-4
Citations number
5
Categorie Soggetti
Chemistry Analytical
Journal title
Analytica chimica acta → ACNP
ISSN journal
00032670
Volume
306
Issue
1
Year of publication
1995
Pages
1 - 4
Database
ISI
SICI code
0003-2670(1995)306:1<1:ATPBIS>2.0.ZU;2-L
Abstract
Ag2S embedded into a 100 nm thin film of SiO2 was fabricated synthetic ally from its constituents by ion implantation. The ion sensing charac teristics of such film material for Ag+ were shown to be analogous to conventional bulk materials, giving sensitivities less than or equal t o 59 mV per concentration decade.