CHEMICAL-VAPOR-DEPOSITED SILICON-CARBIDE MIRRORS FOR EXTREME-ULTRAVIOLET APPLICATIONS

Advances in optical coating and materials technology have made possibl e the development of instruments with substantially improved efficienc y in the extreme ultraviolet (EUV). For example, the development of ch emical vapor deposited (CVD) SIC mirrors provides an opportunity to ex tend the range of normal-incidence instruments down to 60 nm. CVD SIC is a highly polishable material yielding low-scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SIC an attractive mirror and/or coating material for EUV applicati ons. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed. (C) 1997 Society of Photo-Optical Instru mentation Engineers.