INTERFEROMETRIC FABRICATION OF MODULATED SUBMICROMETER GRATINGS IN PHOTORESIST

Interferometric recording is applied to the fabrication of modulated s ubmicrometer gratings in photoresist. High diffraction efficiency requ ires optimized recording conditions, which are obtained by the use of an on-axis continuous surface-relief grating for the generation of the object beam. The optimized phase function is copied into the resist l ayer by means of a self-aligned two-step recording process with an int ermediate copy in a volume photopolymer hologram. As a result, we demo nstrate high carrier frequency surface-relief off-axis fan-out grating s for illumination in transmission with visible light.