RATE OF H-2 ATOMIZATION OVER THE SURFACE OF A HOT TUNGSTEN FILAMENT

Authors
STOBINSKI L DUS R
Citation
L. Stobinski et R. Dus, RATE OF H-2 ATOMIZATION OVER THE SURFACE OF A HOT TUNGSTEN FILAMENT, Vacuum, 46(5-6), 1995, pp. 433-436
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
46
Issue
5-6
Year of publication
1995
Pages
433 - 436
Database
ISI
SICI code
0042-207X(1995)46:5-6<433:ROHAOT>2.0.ZU;2-E
Abstract
A new adsorption-desorption method for determining the efficiency of H -2 thermal dissociation on a hot metal surface is proposed. The result s obtained by means of this method confirm the validity of Langmuir's equation describing H-2 atomization on a hot tungsten surface within t he temperature range 1020-1315 K at a H-2 pressure of 2 x 10(-3) torr. A comparison of our results with Brennan-Fletcher's equation gives lo wer values for the efficiency of H-2 atomization.