Today there are hardly any products in optical industry which do not e
mploy optical coatings. Mainly in the UV spectral region, laser induce
d damage thresholds of these coatings are a limiting factor for the de
velopment of cost-effective optics. The high power optical components
and dielectric coatings have to be developed to cavity optics, beam re
lay optics, mask imaging optics, and masks. Therefore, we used ultralo
w loss conventional electron-beam evaporation for Al2O3/SiO2 dielectri
c multilayers. Based on a fundamental coating technique, both multilay
er mean background absorption and absorption at localized spikes have
been reduced drastically. The resulting KrF laser damage threshold of
HR coatings is 16 J cm(-2) (1-on-1, 30 ns MSG). Multilayers have been
characterized by atomic force microscopy, photothermal microscopy, abs
orption measurements, and spectroscopy of sputtered neutrals.