ESTIMATE OF THE ELECTRON POWER DEPOSITION PROFILE IN CHS

The electron power deposition profile has been estimated experimentall y during the ion cyclotron range of frequency (ICRF) heating and the e lectron cyclotron resonance heating (ECRH) in the compact helical syst em (CHS). The time evolution of the local electron temperature is meas ured from the second harmonic electron cyclotron emission (ECE) using super heterodyne radiometer. The absorbed power by electrons has been derived from the change in the slopes of the local electron temperatur e just before and after the input power is turned off. The power depos ition profiles of electrons are compared with results from the calcula tion code in ICRF experiment. Those results show good agreement. In th e ECRH experiment the input power is modulated to reduce the power dep osition profile. Those analyses give results that the input power is a bsorbed around rho=0.6.