TEMPERATURE SCALINGS IN THE REPUTE-1 REVERSED-FIELD PINCH PLASMA

Statistical property of ion and electron temperatures on various plasm a parameters has been investigated in REPUTE-1 reversed field pinch (R FP) plasmas. The scalings laws are expressed in terms of the plasma cu rrent, loop voltage and line averaged density. Dependence on other par ameters seems to be weak. The operational range of density is wide in REPUTE-1, and it is limited by Hugill number Hsimilar to 1, which is another expression of I-p/N, where I-p is the plasma current and N is the area density. Obtained scaling laws are T-i proportional to V-Loop 1.3x (n) over bar(e)-0.3, Te proportional to I(p)(0.8)x<(n)(o)ver bar >(e)-0.2 where n(e) is the line averaged electron density and V-Loop i s the loop voltage. The electron temperature has roughly same dependen ce as other RFP devices. The I-p dependence of ion temperature is not found in REPUTE-1, while some RFP devices demonstrate linear dependenc e.