ON THE DISTRIBUTION OF NI3S2 IN CORROSION LAYERS OF NIO-NI3S2

Citation
Ag. Andersen et P. Kofstad, ON THE DISTRIBUTION OF NI3S2 IN CORROSION LAYERS OF NIO-NI3S2, Oxidation of metals, 43(1-2), 1995, pp. 173-184
Citations number
13
Categorie Soggetti
Metallurgy & Metallurigical Engineering
Journal title
ISSN journal
0030770X
Volume
43
Issue
1-2
Year of publication
1995
Pages
173 - 184
Database
ISI
SICI code
0030-770X(1995)43:1-2<173:OTDONI>2.0.ZU;2-6
Abstract
Qualitative studies have been made of the interfacial tension between Ni3+/-xS2 and different oxides (NiO, CoO, and feldspar). The results s uggest reasons why Ni3+/-xS2 is distributed as an interconnected netwo rk along NiO grains in rapidly growing scales formed during reaction o f nickel with SO2 and SO2 + O-2 at temperatures from about 550 to 850 degrees C. In the system NiO-Ni3+/-xS2 interfacial energies may stabil ize a network of sulfide along edges of NiO grains. Ni3+/-xS2 does not wet the silicate material (feldspar), and this is consistent with pre vious interpretations that silicates formed by segregation of silicon to NiO interfaces disrupt the sulfide network in scales and thereby pr ovide improved corrosion resistance.