Qualitative studies have been made of the interfacial tension between
Ni3+/-xS2 and different oxides (NiO, CoO, and feldspar). The results s
uggest reasons why Ni3+/-xS2 is distributed as an interconnected netwo
rk along NiO grains in rapidly growing scales formed during reaction o
f nickel with SO2 and SO2 + O-2 at temperatures from about 550 to 850
degrees C. In the system NiO-Ni3+/-xS2 interfacial energies may stabil
ize a network of sulfide along edges of NiO grains. Ni3+/-xS2 does not
wet the silicate material (feldspar), and this is consistent with pre
vious interpretations that silicates formed by segregation of silicon
to NiO interfaces disrupt the sulfide network in scales and thereby pr
ovide improved corrosion resistance.