GROWTH-MORPHOLOGY AND CHARACTERISTIC STRUCTURE IN NANOCRYSTALLINE SI FILM OF HIGH-CONDUCTIVITY

Authors
WANG LC FENG D EPICIER T ESNOUF C XIA H HE YL LI Q CHU YM MING NB
Citation
Lc. Wang et al., GROWTH-MORPHOLOGY AND CHARACTERISTIC STRUCTURE IN NANOCRYSTALLINE SI FILM OF HIGH-CONDUCTIVITY, Applied physics letters, 66(8), 1995, pp. 968-970
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
66
Issue
8
Year of publication
1995
Pages
968 - 970
Database
ISI
SICI code
0003-6951(1995)66:8<968:GACSIN>2.0.ZU;2-Z