PULSED-LASER DEPOSITION OF NBTEX THIN-FILMS

Citation
F. Grangeon et al., PULSED-LASER DEPOSITION OF NBTEX THIN-FILMS, Applied surface science, 86(1-4), 1995, pp. 160-164
Citations number
12
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
86
Issue
1-4
Year of publication
1995
Pages
160 - 164
Database
ISI
SICI code
0169-4332(1995)86:1-4<160:PDONT>2.0.ZU;2-I
Abstract
Pulsed laser deposition (PLD) of niobium telluride was performed by va porisation of NbTe2 bulk targets with subsequent deposition of the abl ation plume on heated silicon substrates. The laser energy density ont o the target and the temperature of the substrate appear to play a maj or role in the quality of the deposited films. Correlations between th ese two parameters and the film composition on the one hand, and the s tructural properties on the other, were sought by systematic elemental and X-ray diffraction analysis. The deposition conditions for well-cr ystallized PLD films belonging to the Nb5Te4 (1D) structural type with strong (110) preferential orientation were demonstrated for the first time.