PULSED-LASER DEPOSITION OF NBTEX THIN-FILMS

Pulsed laser deposition (PLD) of niobium telluride was performed by va porisation of NbTe2 bulk targets with subsequent deposition of the abl ation plume on heated silicon substrates. The laser energy density ont o the target and the temperature of the substrate appear to play a maj or role in the quality of the deposited films. Correlations between th ese two parameters and the film composition on the one hand, and the s tructural properties on the other, were sought by systematic elemental and X-ray diffraction analysis. The deposition conditions for well-cr ystallized PLD films belonging to the Nb5Te4 (1D) structural type with strong (110) preferential orientation were demonstrated for the first time.