LASER-INDUCED ETCHING AND DEPOSITION OF TUNGSTEN IN WF6-H-2 ATMOSPHERE

Citation
K. Piglmayer et al., LASER-INDUCED ETCHING AND DEPOSITION OF TUNGSTEN IN WF6-H-2 ATMOSPHERE, Applied surface science, 86(1-4), 1995, pp. 484-487
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
86
Issue
1-4
Year of publication
1995
Pages
484 - 487
Database
ISI
SICI code
0169-4332(1995)86:1-4<484:LEADOT>2.0.ZU;2-Y
Abstract
Combined thermally induced etching and deposition of W in a mixture of WF6 and H-2 is investigated by local laser-induced patterning of thin tungsten layers on quartz. The process divides into areas of pure etc hing and deposition, depending on the partial pressures of the gases.