Jm. Gaines et Ca. Ponzoni, IN-SITU CHARACTERIZATION OF II-VI MOLECULAR-BEAM EPITAXY, Physica status solidi. b, Basic research, 187(2), 1995, pp. 309-313
In-situ monitoring of crystal growth can provide valuable information
on growth processes and feedback to control growth. The use of reflect
ion high-energy electron diffraction (RHEED) and cathodoluminescence (
CL) to examine molecular beam epitaxy (MBE) of II/VI wide-band-gap sem
iconductors is described.