Numerically-evaluated space-charge effects on the ionic current determ
ining oxide growth rate show modification factors which can change mar
kedly with oxide thickness. The electric-field modification factors ca
n typically change the rate of oxidation by an order-of-magnitude. In
addition to affecting rate, the thickness-dependence of the modificati
on factors has an important bearing on the growth law. The results of
new numerical calculations are compared to, and found to be in reasona
ble accord with, published analytical developments for the thin-film a
nd the thick-film limits. The voltages across the growing oxide are li
kewise evaluated, and compared to voltages predicted analytically for
these limits.