UNIFORM PYRAMID FORMATION ON ALKALINE-ETCHED POLISHED MONOCRYSTALLINE(100)SILICON-WAFERS

Pyramidal texturing of monocrystalline silicon using alkaline etchants depends strongly upon the initial condition of the wafer surface and upon etching parameters, Texturization of polished wafers is often inc omplete, with non-textured areas arising to yield high values of refle ctance. A new technique is introduced for uniform pyramid formation on polished wafers, Nitrogen is used to expel dissolved oxygen in the et ch solution, since it has been observed that oxidizing agents act to e ncourage polished etch surfaces.