THE EFFECT OF SPUTTER ETCHING ON THE SURFACE CHARACTERISTICS OF DYED ARAMID FABRICS

Authors
KOBAYASHI S WAKIDA T NIU S HAZAMA S ITO T SASAKI Y
Citation
S. Kobayashi et al., THE EFFECT OF SPUTTER ETCHING ON THE SURFACE CHARACTERISTICS OF DYED ARAMID FABRICS, Journal of the Society of Dyers and Colourists, 111(3), 1995, pp. 72-76
Citations number
18
Categorie Soggetti
Materiales Science, Textiles","Chemistry Applied
Journal title
Journal of the Society of Dyers and Colourists → ACNP
ISSN journal
00379859
Volume
111
Issue
3
Year of publication
1995
Pages
72 - 76
Database
ISI
SICI code
0037-9859(1995)111:3<72:TEOSEO>2.0.ZU;2-T
Abstract
Three kinds of aramid fabrics, Technora (modified p-aramid), Conex (m- aramid) and Kevlar (p-aramid), were subjected to sputter etching and a rgon low-temperature plasma treatments after dyeing in black with disp erse dyes. The depth of shade increased considerably on Technora and K evlar with the sputter etching treatment, but not on Conex fabrics. Ar gon low-temperature plasma treatment had virtually no effect on the de pth of shade on the aramid fabrics.