THE EFFECT OF SPUTTER ETCHING ON THE SURFACE CHARACTERISTICS OF DYED ARAMID FABRICS

Citation
S. Kobayashi et al., THE EFFECT OF SPUTTER ETCHING ON THE SURFACE CHARACTERISTICS OF DYED ARAMID FABRICS, Journal of the Society of Dyers and Colourists, 111(3), 1995, pp. 72-76
Citations number
18
Categorie Soggetti
Materiales Science, Textiles","Chemistry Applied
ISSN journal
00379859
Volume
111
Issue
3
Year of publication
1995
Pages
72 - 76
Database
ISI
SICI code
0037-9859(1995)111:3<72:TEOSEO>2.0.ZU;2-T
Abstract
Three kinds of aramid fabrics, Technora (modified p-aramid), Conex (m- aramid) and Kevlar (p-aramid), were subjected to sputter etching and a rgon low-temperature plasma treatments after dyeing in black with disp erse dyes. The depth of shade increased considerably on Technora and K evlar with the sputter etching treatment, but not on Conex fabrics. Ar gon low-temperature plasma treatment had virtually no effect on the de pth of shade on the aramid fabrics.