HOLOGRAPHIC STUDY OF NON DESTRUCTIVE THERMAL-STRESS IN MULTIDIELECTRIC FILMS COATED FOR 10,6 MU-M

Citation
P. Baulaigue et al., HOLOGRAPHIC STUDY OF NON DESTRUCTIVE THERMAL-STRESS IN MULTIDIELECTRIC FILMS COATED FOR 10,6 MU-M, Journal of optics, 25(6), 1994, pp. 225-229
Citations number
10
Categorie Soggetti
Optics
Journal title
ISSN journal
0150536X
Volume
25
Issue
6
Year of publication
1994
Pages
225 - 229
Database
ISI
SICI code
0150-536X(1994)25:6<225:HSONDT>2.0.ZU;2-M
Abstract
We have developed a interferometric method, using holography, so that a thermal stress of a multidielectric coating deposited on glass subje ct to continuous laser flow at CO2 power can be observed in real time. This method is used with an image acquisition system so that computer processing of the observed fringes is possible.