CHARACTERIZATION OF SI3N4 SURFACE AFTER E XCIMER-LASER RADIATION

Citation
Y. Akimune et al., CHARACTERIZATION OF SI3N4 SURFACE AFTER E XCIMER-LASER RADIATION, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 103(2), 1995, pp. 128-131
Citations number
7
Categorie Soggetti
Material Science, Ceramics
ISSN journal
09145400
Volume
103
Issue
2
Year of publication
1995
Pages
128 - 131
Database
ISI
SICI code
0914-5400(1995)103:2<128:COSSAE>2.0.ZU;2-H
Abstract
The effect of excimer laser radiation to silicon nitride ceramic surfa ce morphology was investigated, The response of the surface at irradia tion to different laser fluences and in-vacuo measurements of the part icle emission due to laser irradiation were examined. The irradiated s urface showed pillar-like features at low fluence (20kJ/m(2)), however , hat surfaces were produced at high fluence (100kJ/m(2)). Quadrupole mass spectrometry during laser irradiation showed that the emitted par ticles were Si+, Y+, O and N, It is thought that the surface silicon n itride and/or grain boundary crystal phase (Si3N4 . Y2O3) was decompos ed during laser irradiation, and the resulting Si+ to form SiO2 layers and/or pillars on the surface. These surface features degrated the st rength of the specimens due to pore formation just under the surface.