Antiferroelectric lead zirconate (PbZrO3) films derived from acetate p
recursors have been fabricated on Pt/Ti-coated silicon wafers and fuse
d silica at 700 degrees C with an automatic dip-coating process. Films
formed directly on the metallized silicon wafer showed the coexistenc
e of perovskite and pyrochlore phases. A pre-coated titania layer of a
bout 10 nm coexistence of perovskite and facilitated the formation of
the desired perovskite phase. Films deposited on fused silica exhibite
d interactions between lead and silica which inhibited the crystalliza
tion of the films. In this case, a pre-coated titania layer in the ran
ge 50-75 nm acted as a diffusion barrier layer, allowing the formation
of the perovskite phase. Antiferroelectricity in the films was confir
med by X-ray superstructure, dielectric double hysteresis loops and d.
c. bias behaviour at room temperature. The corresponding transverse el
ectro-optic properties were also measured films deposited on fused sil
ica.