We present a study of ultrafast carrier dynamics on the clean Si(100)2
X1 surface using time-resolved photoemission spectroscopy. A rapid the
rmalization inside the surface band is observed, and the carrier relax
ation occurs on a time scale of a few hundred femtoseconds to a few pi
coseconds depending on the initial state energy. The relaxation time i
ncreases as the initial state energy decreases with respect to the ban
d minimum.