Vacuum arc plasma deposition combined with magnetic filtering of the p
lasma to remove macroparticles is a promising technique for the produc
tion of metallic, compound and hard amorphous carbon thin films. High
efficiency of the magnetic filter is a crucial parameter for the appli
cation of this technique. We report investigations of the influence of
different filter designs, magnetic field configurations and electric
potentials on the filter efficiency. We analyse the transport mechanis
ms on which the flow of plasma through the filter is based, and descri
be and discuss the occurrence of instabilities in magnetic filters. Wi
th an optimum filter arrangement we were able to obtain a filter outpu
t of 25% of the total number of ions produced by the vacuum arc discha
rge.