HIGH-PRECISION FORMING OF MASKING COATINGS OF X-RAY MASKS DIRECTLY ONTHE MEMBRANES

X-ray masks have been made directly on 1.8-2.0 mu m thick suspended me mbranes with +/-0.02 mu m positioning accuracy in the plane of gold ma sking coating with a thickness of 0.5-0.8 mu m for 0.25-0.4 mu m eleme nts. This result has been achieved by implementing the mask after leav ing it freely suspended. The mask etching was done by reactive ion etc hing with a magnetron type source and scanning linear ion beams. The s tationary substrate holder on the basis of the Peltier effect allowed cooling the membrane with flowing helium.