THE INVESTIGATION OF THE CONTRAST OF X-RAY MASKS REPAIRED BY LASER-INDUCED CVD

Citation
Ef. Reznikova et al., THE INVESTIGATION OF THE CONTRAST OF X-RAY MASKS REPAIRED BY LASER-INDUCED CVD, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 359(1-2), 1995, pp. 400-403
Citations number
10
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
ISSN journal
01689002
Volume
359
Issue
1-2
Year of publication
1995
Pages
400 - 403
Database
ISI
SICI code
0168-9002(1995)359:1-2<400:TIOTCO>2.0.ZU;2-5
Abstract
Rhenium, gold and platinum film micropatterns were deposited by a puls e nitrogen laser(lambda = 337 nm) on a surface of a silicon membrane f rom vapors of Re-2(CO)(10), (CH3)(2)Au(dpm), and Pt(hfac)(2), respecti vely. The high marginal sharpness and the thickness uniformity of the deposited films was provided by the use of a powerful nanosecond pulse laser, a projective system for delineation of the irradiation zone an d laser beam microscanning at the limits of this zone. The scheme of t he set for direct laser deposition of film micropatterns was presented . It was shown that X-ray masks with golden patterns on silicon membra nes may be repaired by laser-induced chemical vapor deposition (LCVD). The contrasts of deposited Au, Re and Pt films correspond to calculat ed contrasts.