PRELIMINARY EXPERIENCE OF OPTICAL-ELEMENTS FABRICATION BY X-RAY-LITHOGRAPHY

X-ray lithography using synchrotron radiation from the VEPP-3 storage ring was applied for the fabrication of test specimens of some optical elements such as Fresnel lenses and arrays of optical elements for vi sible light. A promising advantage of the application of X-ray lithogr aphy is the possibility of micron scale patterning on curved surfaces. The patterns of Fresnel-like structures were generated by an annular laser photoplotter for the fabrication of an X-ray mask on a 2-mu m-th ick silicon membrane with a 1.5-mu m-thick gold absorber. The X-ray li thography station at the VEPP-3 storage ring was used for deep X-ray l ithography.