Sa. Bulgakova et al., CHAIN TRANSFER AS A METHOD FOR MODIFICATI ON OF PMMA-BASED RESISTS, Vysokomolekularnye soedinenia. Seria A, 37(4), 1995, pp. 706-708
A method is proposed to enhance the sensitivity to electron beam and s
ynchrotron X-rays of poly-methylmethacrylate used as a resist in submi
cron lithography. The method is based on the reactions of chain transf
er to disilanes of various chemical nature in the course of polymer sy
nthesis.