D. Naujoks et W. Eckstein, SPUTTERING OF PLASMA-FACING MATERIAL BY SIMULTANEOUS BOMBARDMENT WITHCARBON AND DEUTERIUM IONS, Journal of nuclear materials, 222, 1995, pp. 993-996
Citations number
12
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
The sputtering of material (C, Si, and W) exposed to a plasma with an
electron temperature of 40 eV containing deuterium ions and carbon ion
s has been investigated using the computer program TRIDYN. The sputter
ing yields for the various elements were calculated dependent on the p
lasma ion fluence and the carbon concentration in the plasma. The ques
tion, whether erosion of the target material or deposition of the carb
on atoms occurs, strongly depends on the carbon concentration in the p
lasma and the target atom species. Also a transition from a erosion ph
ase to a deposition phase (and also reversed) during the exposure was
observed under certain conditions. Steady state conditions were achiev
ed only in a time scale which is of the same order as the discharge ti
me in today's fusion experiments. An analytical model has been develop
ed and the results agree well with those obtained by computer simulati
ons.