Vh. Chan et Je. Chung, THE IMPACT OF NMOSFET HOT-CARRIER DEGRADATION ON CMOS ANALOG SUBCIRCUIT PERFORMANCE, IEEE journal of solid-state circuits, 30(6), 1995, pp. 644-649
This study presents some of the first experimental data on the impact
of NMOSFET hot-carrier-induced degradation on CMOS analog subcircuit p
erformance, Because of circuit design requirements, most NMOSFET's use
d for analog applications are biased in the saturation region with a l
ow gate-to-source voltage, Under such operating conditions, in additio
n to interface states, significant numbers of hole traps are also gene
rated inside the gate oxide, Because acceptor-type interface states ar
e mostly unoccupied in the saturation region, hole traps are found to
have a much more significant impact on analog NMOSFET device performan
ce, The hot-carrier-induced degradation of analog subcircuit performan
ce is also found to be quite sensitive to the particular circuit desig
n and operating conditions, Circuit performance and reliability tradeo
ffs are examined.