THE IMPACT OF NMOSFET HOT-CARRIER DEGRADATION ON CMOS ANALOG SUBCIRCUIT PERFORMANCE

Authors
Citation
Vh. Chan et Je. Chung, THE IMPACT OF NMOSFET HOT-CARRIER DEGRADATION ON CMOS ANALOG SUBCIRCUIT PERFORMANCE, IEEE journal of solid-state circuits, 30(6), 1995, pp. 644-649
Citations number
18
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00189200
Volume
30
Issue
6
Year of publication
1995
Pages
644 - 649
Database
ISI
SICI code
0018-9200(1995)30:6<644:TIONHD>2.0.ZU;2-N
Abstract
This study presents some of the first experimental data on the impact of NMOSFET hot-carrier-induced degradation on CMOS analog subcircuit p erformance, Because of circuit design requirements, most NMOSFET's use d for analog applications are biased in the saturation region with a l ow gate-to-source voltage, Under such operating conditions, in additio n to interface states, significant numbers of hole traps are also gene rated inside the gate oxide, Because acceptor-type interface states ar e mostly unoccupied in the saturation region, hole traps are found to have a much more significant impact on analog NMOSFET device performan ce, The hot-carrier-induced degradation of analog subcircuit performan ce is also found to be quite sensitive to the particular circuit desig n and operating conditions, Circuit performance and reliability tradeo ffs are examined.