THE USE OF X-RAY SOURCES FOR HARDNESS STU DY, CONTROL AND OPTIMIZATION OF PROCESS FOR MICROELECTRONIC DEVICES

Authors
FLAMENT O
Citation
O. Flament, THE USE OF X-RAY SOURCES FOR HARDNESS STU DY, CONTROL AND OPTIMIZATION OF PROCESS FOR MICROELECTRONIC DEVICES, Onde electrique, 75(3), 1995, pp. 72-76
Citations number
NO
Categorie Soggetti
Telecommunications,"Engineering, Eletrical & Electronic
Journal title
Onde electrique → ACNP
ISSN journal
00302430
Volume
75
Issue
3
Year of publication
1995
Pages
72 - 76
Database
ISI
SICI code
0030-2430(1995)75:3<72:TUOXSF>2.0.ZU;2-V
Abstract
The use of X-ray sources for control and optimisation of hardened proc ess is presented. Main effects related to irradiation with low energy photons are also described.