WAVELENGTH SENSITIVITY OF PHOTOOXIDATION OF STYRENE-BUTADIENE-STYRENECOPOLYMER

Authors
Citation
Xz. Hu et Zb. Lu, WAVELENGTH SENSITIVITY OF PHOTOOXIDATION OF STYRENE-BUTADIENE-STYRENECOPOLYMER, Polymer degradation and stability, 48(1), 1995, pp. 99-102
Citations number
3
Categorie Soggetti
Polymer Sciences
ISSN journal
01413910
Volume
48
Issue
1
Year of publication
1995
Pages
99 - 102
Database
ISI
SICI code
0141-3910(1995)48:1<99:WSOPOS>2.0.ZU;2-S
Abstract
The wavelength sensitivity of SBS exposed to filtered xenon are radiat ion and sunlight was determined by the sharp cut filter technique base d on the changes in IR absorption and mechanical properties. The spect ral response curves of SBS exposed to both filtered xenon lamp and sun light were similar. They showed that wavelength region, responsible fo r photooxidation of SBS, is in the range of approximately 290-380nm. T he wavelength sensitivity of polystyrene exposed to filtered xenon are radiation was also determined and was different from that of SBS. It is suggested that the wavelength sensitivity of SBS is determined main ly by the polybutadiene component.