CHARACTERISTICS OF SHEATH INSTABILITY IN A DOUBLE PLASMA-DEVICE

Citation
A. Sarma et al., CHARACTERISTICS OF SHEATH INSTABILITY IN A DOUBLE PLASMA-DEVICE, Physics of plasmas, 4(1), 1997, pp. 61-68
Citations number
17
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
ISSN journal
1070664X
Volume
4
Issue
1
Year of publication
1997
Pages
61 - 68
Database
ISI
SICI code
1070-664X(1997)4:1<61:COSIIA>2.0.ZU;2-B
Abstract
Observations are carried out in a double-plasma device where the insta bilities are excited around the negatively biased grid when there is s ufficient plasma density difference between the two chambers and an io n beam is injected from the source to the target section. If the densi ty difference between the two chambers is slowly decreased, the instab ilities exhibit oppositely different characteristics after a critical value. Below the critical value of the density ratio, the energy reson ance of the background ions and the beam ions is a typical condition f or the excitation of such instabilities. Chaotic phenomena occur when there is a hump in the plasma potential profile near the sheath edge. Above the critical value of the density ratio, the instability occurs due to the interaction of the three beams that arise due to asymmetry of the sheath potential. (C) 1997 American Institute of Physics.