Doped channel pseudomorphic In0.49Ga0.51P/In-0.20 Ga0.80As/GaAs hetero
structure field effect transistors have been fabricated on GaAs substr
ate with 0.25 mu m T-gates and self-aligned ohmic contact enhancement,
By introducing the channel doping and reducing the series resistances
, a high current density of 500 mA/mm is obtained in combination with
cut-off frequencies of f(T) = 68 GHz and f(max) = 160 GHz, The channel
doping did not affect the RF-performance of the device essentially, w
hich is additionally reflected in noise figures below 1.0 dB with an a
ssociated gain of 14.5 dB at 12 GHz.