LOW-FREQUENCY NOISE IN 6H-SIC MOSFETS

Citation
Jb. Casady et al., LOW-FREQUENCY NOISE IN 6H-SIC MOSFETS, IEEE electron device letters, 16(6), 1995, pp. 274-276
Citations number
19
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
16
Issue
6
Year of publication
1995
Pages
274 - 276
Database
ISI
SICI code
0741-3106(1995)16:6<274:LNI6M>2.0.ZU;2-W
Abstract
The noise spectra for n-channel, depletion-mode MOSFETs fabricated in 6H-SiC material were measured from 1-10(5) Hz at room temperature; Dev ices were biased in the linear regime, where the noise spectra was fou nd to be dependent upon the drain-to-source bias current density. At a drain-to-source current of 50 mu A for MOSFETs with a W/L of 400 mu m /4 mu m, the measured drain-to-source noise power spectral density was found to be A/f(lambda), with A being 2.6 x 10(-12) V-2, and lambda b eing between 0.73 and 0.85, indicating a nonuniform spatial trap densi ty skewed towards the oxide-semiconductor interface. The measured Hoog e parameter (alpha(H)) was 2 x 10(-5). This letter represents the firs t reported noise characterization of 6H-SiC MOSFET's.